Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0e433c1625fc509a087c912b440da84b |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-20 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01C7-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01C1-14 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-62 |
filingDate |
2005-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7233e1b0f09a756d102a058b34558eb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1193a2e7db57903c3334f4d8f5421bd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee0281af9f4c2fe719317c51f223ba9e |
publicationDate |
2006-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2006249793-A1 |
titleOfInvention |
Nonlinear via arrays for resistors to reduce systematic circuit offsets |
abstract |
A thin film resistor structure includes a plurality of thin film resistor sections. Conductive vias ( 5 ) are disposed on a first end of each of the thin film resistor sections, respectively. The first conductor ( 2 ) is connected to the vias of the first end, and a second conductor ( 3 ) is connected to vias on a second end of each of the thin film resistor sections. A distribution of a parameter of a batch of circuits including the thin film resistor structure indicates a systematic error in resistance values. Based on analysis of the distribution and the circuit, or more of the vias are individually moved at the layout grid level by a layout grid address unit to reduce the systematic error by making corresponding adjustments on a via reticle of a mask set used for making the circuits. Expensive laser trimming of thin film resistors of the circuit is thereby avoided. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016004806-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11545480-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103620706-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9245079-B1 |
priorityDate |
2005-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |