http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006244152-A1

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filingDate 2006-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32158829890c757856f0568b1fb0f66c
publicationDate 2006-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2006244152-A1
titleOfInvention Barrier film integrity on porous low k dielectrics by application of a hydrocarbon plasma treatment
abstract A method for treating a dielectric material using hydrocarbon plasma is described, which allows for thinner films of barrier material to be used to form a robust barrier.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007117371-A1
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Total number of triples: 25.