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publicationDate 2006-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2006190850-A1
titleOfInvention Method for optimizing the geometry of structural elements of a circuit design pattern and method for producing a photomask
abstract A method for optimizing the geometry of structural elements of a circuit pattern involves providing an overall circuit pattern of the circuit design and a plurality of basic patterns. Subsequently, the circuit pattern of the circuit design is iteratively decomposed into corresponding basic patterns in order to classify those parts of the circuit pattern of the plurality of structural elements wherein there exists a match with the basic pattern. Subsequently, further basic patterns are determined for those parts of the circuit pattern which were not previously classified. After applying a specification for optimizing the geometry of the structural elements, the optimized basic patterns are inserted into the circuit design thus achieving an improvement of the optical imaging properties.
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