| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2ecfdb760956702625b306bb4297ee0e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_efc372ad92d75d2bc22b4d1e450dbc5f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c253b9ab7bf274a3e64de7cd6e874bd5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5b1d3518ee3e7a3c7920ccd52adbfd07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6d7cbf1cb7ec681c714af20749220031 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K19-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K10-462 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-166 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00 |
| filingDate |
2006-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c140ea5e5aad6127d8e56390eceba4d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afd5261504907b595e1dc91ef219d745
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da281d4468a9dca1c81ef8c3b42171fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_628d1abdb1af77b4d6075b0ffb9d8a76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02a74e3ee867240658b5534c39006bd7 |
| publicationDate |
2006-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2006183029-A1 |
| titleOfInvention |
Method for producing a mask arrangement and use of the mask arrangement |
| abstract |
A method is provided for producing a mask arrangement that is used for additive forming of organic semiconductor material regions on a substrate. The mask arrangement is formed by applying a photocrosslinkable polymer material to a mask carrier region, exposing it in a controlled and selective and thereby patterned manner and subsequently developing it. The developing process facilitates the removal of polymer material regions that are not exposed, and have not been photocrosslinked, from surface regions of the mask carrier region such that the desired mask arrangement is produced. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022077433-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9650741-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008254555-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7635609-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008130491-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014248443-A1 |
| priorityDate |
2005-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |