Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_86a10e43efb7d4c00bf72386c9869751 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_50a90ba34f203ac5efb1b17247320771 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 |
filingDate |
2004-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ce1e9f467e415f351e6d1cfdf2a4952 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a185fdc6873a0f0b160b01c8816ab65f |
publicationDate |
2006-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2006141387-A1 |
titleOfInvention |
Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
abstract |
A chemically amplified positive photoresist composition for thick film that is used for forming a thick-film photoresist layer with a film thickness of 10 to 150 μm on top of a support, comprising (A) a compound that generates acid on irradiation with active light or radiation, (B) a resin that displays increased alkali solubility under the action of acid, and (C) an alkali-soluble resin, wherein the component (B) comprises a resin formed from a copolymer containing a structural unit (b1) with a specific structure. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9057951-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016148741-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011053083-A1 |
priorityDate |
2004-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |