| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2313a2541e0eec07f68ef0b41654127b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24182 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01P3-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01P11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01P3-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01P11-006 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01P11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01P3-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-80 |
| filingDate |
2004-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0022daca57f18f65998f40ac44bc3658
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09fb72404e96702b8ca843ec36cddc6a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ac37325047aac5e0310bb6c68b110cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82ef07f65322a079fdd4b60f96ecb9d0 |
| publicationDate |
2006-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2006102937-A1 |
| titleOfInvention |
Dielectric line and production method therefor |
| abstract |
A dielectric line having a sufficient ensured strength and being suitable for mass production and a production method therefor are provided. The production method is a method for manufacturing a dielectric line having a dielectric strip which is provided between two conductive plates approximately parallel to each other and which has a width smaller than that of the conductive plates, and dielectric medium layers which are filled between the conductive plates other than the dielectric strip and which is composed of a porous material having a dielectric constant smaller than that of the dielectric strip. The dielectric line (NRD guide) is produced by film forming steps S 11 and S 12 in which a film of a dielectric raw material is formed on one of the conductive plates, a strip exposure step S 13 in which a part of the above film having a shape corresponding to the dielectric strip is exposed to predetermined light, beams, or vapor, and pore forming steps S 15 and S 16 in which the entire film of the dielectric raw material is made porous. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7935626-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006116000-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7985677-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014183507-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010136782-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7732349-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9741953-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006115983-A1 |
| priorityDate |
2003-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |