| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9d91b2f9432de1bcf3290473f7a3e96c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F-
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-18 |
| filingDate |
2004-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01113b656146cb12043ed382eae9f704
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba273872c9cf98175ea3597b30daada2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97ba22d1fec247d8b65682bfd0d510c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca2fc80f521ef359aac92a875fbea0a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f57bcf69a343924638264b0b677c2591 |
| publicationDate |
2006-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2006063095-A9 |
| titleOfInvention |
Novel photosensitive resin compositions |
| abstract |
A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate. |
| priorityDate |
2003-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |