Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3d17d891b2217f3c437addb4d248183d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_579e59efb91f89a6795eead0e16b80e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c4bcb6cc2ca4f645959b48b30516659c |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1362 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1288 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1362 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-77 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00 |
filingDate |
2003-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_713dcf11bed78fdcb0e4d4f1477429cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73bedb69c388310cbc419478d57a0fd9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24645838e373c0f69079458e18d70ef2 |
publicationDate |
2006-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2006046361-A1 |
titleOfInvention |
Stripping composition for removing a photoresist and method of manufacturing tft substrated for a liquid crystal display device using the same |
abstract |
In a stripping composition for easily removing a photoresist without an adverse effect and a method of manufacturing a TFT substrate for an LCD device using the same, the stripping composition includes acetic acid and ozone gas contained in the acetic acid as a bubble form to remove the photoresist including novolak. A photoresist pattern including novolak is formed on a predetermined layer ( 24 ) formed on a substrate ( 10 ). The layer is etched using the photoresist pattern as a mask to form a pattern of the layer. The photoresist pattern is removed using the stripping composition. The stripping composition is cheap and more effectively protects the environment in comparison with the conventional stripping compositions. Additionally, an O 2 ashing process performed before or after a stripping process may be omitted to thereby simplify a stripping process. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101913184-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9615463-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016071891-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006220018-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011000876-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8218120-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9443886-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7776635-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008137316-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008096332-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014038371-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009020464-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7977250-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011130009-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7776668-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010283929-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007241331-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009077093-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016209718-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10462908-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005245010-A1 |
priorityDate |
2002-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |