| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_544d7a6faf541c8ab5c42a29732f729d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_41a63eab3a6cfcab8a0db3fbd71736d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e52a9c391573b1e484587b9db14751a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B44C1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate |
2004-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01e5ed8e5cc0cb93acebe190990204de
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_831960ee087494d0139045db3d04e7b0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fc83ad52e9a2702283aab5d3eed4e8b |
| publicationDate |
2006-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2006000797-A1 |
| titleOfInvention |
Methods and apparatus for the optimization of etch resistance in a plasma processing system |
| abstract |
In a plasma processing system, including a plasma processing chamber, a method of optimizing the etch resistance of a substrate material is described. The method includes flowing pre-coat gas mixture into the plasma processing chamber, wherein the pre-coat gas mixture has an affinity for a etchant gas flow mixture; striking a first plasma from the pre-coat gas mixture; and introducing a substrate comprising the substrate material. The method also includes flowing the etchant gas mixture into the plasma processing chamber; striking a second plasma from the etchant gas mixture; and etching the substrate with the second plasma. Wherein the first plasma creates a pre-coat residual on a set of exposed surfaces in the plasma processing chamber, and the etch resistance of the substrate material is maintained. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I559395-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007126469-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9412606-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108711552-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8557709-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9496147-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9960031-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007015371-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7906032-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007126469-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015235877-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017032955-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011226734-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8546264-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007238199-A1 |
| priorityDate |
2004-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |