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publicationDate 2005-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2005287032-A1
titleOfInvention Anti-bacterial protection to improve performance of post CMP clean brush
abstract A method including providing a residual bacteria-inhibiting property to a post-chemical mechanical polish (post-CMP) brush. A method including forming a post-chemical mechanical polish (post-CMP) brush; and residually modifying a bacteria-inhibiting property of a portion of an exterior surface of the formed brush. An apparatus including a post-chemical mechanical polish (post-CMP) brush including a residual bacteria inhibiting property.
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