| abstract |
The composition for forming an anti-reflective coating film of the present invention has a hard-volatility and high coating performance. In particular, when the 193 nm ArF excimer laser beam source is applied, the composition exhibits a higher etching property. Therefore, the composition is suitably for forming an anti-reflective coating film with no voids and for a method of forming resist patterns using the composition. The composition for forming an anti-reflective coating film comprising; (A) a hard-volatility light absorbing compound, (B) siloxanepolymer, and (C) a solvent. |