abstract |
The present invention relates to plane-parallel structures of silicon/silicon oxide (silicon/silicon oxide flakes), obtainable by heating plane-parallel structures of SiO y in an oxygen-free atmosphere at a temperature above 400° C., wherein 0.70≦y≦1.8, or plane-parallel structures of silicon/silicon oxide, obtainable by heating plane-parallel structures of SiO x in an oxygen-free atmosphere at a temperature above 400° C., wherein 0.03≦x≦0.95, a process for their production and their use for the production of interference pigments. |