http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005244721-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-162 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 |
| filingDate | 2004-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45d810bca8413f7a789db00ec8997e5d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec27fced3f55022cd2c97f0c735eed3f |
| publicationDate | 2005-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2005244721-A1 |
| titleOfInvention | Composite layer method for minimizing PED effect |
| abstract | A novel composite layer structure method which is suitable for reducing post-exposure delay (PED) effects associated with fabricating a photolithography reticle or mask and eliminating or at least minimizing variations between intended and realized critical dimension values for a circuit pattern fabricated on the reticle or mask. The method includes providing a mask blank having a metal layer, providing a photoresist layer on the metal layer of the mask blank, providing a protective layer on the photoresist layer and photo-cracking the photoresist layer in the desired circuit pattern typically by electron beam exposure. During subsequent post-exposure delay periods, the protective layer prevents or minimizes Q-time narrowing of the photo-cracked photoresist, and consequently, prevents or minimizes narrowing of the critical dimension of a circuit pattern etched in the metal layer according to the width of the photo-cracked photoresist. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9442229-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015087152-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007012335-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008203386-A1 |
| priorityDate | 2004-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.