http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005238991-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-492 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 |
| filingDate | 2005-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd66e778beabf22fa0e2fd1273a597a6 |
| publicationDate | 2005-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2005238991-A1 |
| titleOfInvention | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| abstract | Disclosed herein are a top anti-reflective coating polymer used in a photolithography process, which is one of the fabrication processes for a semiconductor device, a method for preparing the anti-reflective coating polymer, and an anti-reflective coating composition comprising the anti-reflective coating polymer. Specifically, the top anti-reflective coating polymer is used in immersion lithography for the fabrication of a sub-50 nm semiconductor device. The top anti-reflective coating polymer is represented by Formula 1 below: n nwherein R1, R2 and R3 are independently hydrogen or a methyl group; and a, b and c represent the mole fraction of each monomer, and are in the range between about 0.05 and about 0.9. Since a top anti-reflective coating formed using the above anti-reflective coating polymer is not soluble in water, it can be applied to immersion lithography using water as the medium for a light source. In addition, since the top anti-reflective coating can reduce the reflectance from an underlayer, the uniformity of CD is improved, thus enabling the formation of an ultrafine pattern. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011123937-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006008748-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8889344-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007072112-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8911927-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7781141-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006105272-A1 |
| priorityDate | 2004-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 78.