| abstract |
Disclosed is an acceptable defect positioning and manufacturing method for large-scaled photomask blanks, where the defective information of the entire large-scaled photomask blanks or etched and to-be-repaired photomask, upon being acquired by a photomask inspection apparatus, is categorized into a critical area a non-critical area. The so-called critical area is directed to areas where defects are unacceptable, while the non-critical area is directed to areas where defects are acceptable. For large-scaled photomask blanks, if all defects are within the non-critical area, the photomask blanks are deemed acceptable. For large-scaled photomasks, photomask acceptance system only needs to reject photomask blanks whose defects are within the critical area of the mask products. |