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publicationDate 2005-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2005218372-A1
titleOfInvention Modifying the viscosity of etchants
abstract Semiconductor integrated circuit structures, such as stacks containing metal layers, may be etched with a modified viscosity etchant. An increased viscosity etchant, for example, may reduce undercutting when a metal film is being etched.
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