| abstract |
To provide a dresser for a polishing cloth in which a stable dressing performance is maintained, a uniformly polished surface is provided on the surface of the polishing cloth, and in particular, a scratch on a wafer caused by the dissociation of abrasive grains is prevented, and a method for producing the same n A dresser for a polishing cloth includes a base 1 and a dressing part disposed on the surface of the base. The dressing part includes a plurality of abrasive grains 2 and a plate-shaped holding component 3 that holds the abrasive grains 2 . The holding component 3 is composed of cemented carbide, cermet, or ceramic. Alternatively, the holding component 3 may be composed of a material containing silicon to which silicon dioxide is added. A method for producing the dresser for a polishing cloth includes a step of forming adhesive portions having almost the same diameter as that of the abrasive grains at positions corresponding to holding positions of the abrasive grains 2 to be arrayed with regularity, the positions being disposed on the surface of the holding component or a sheet disposed on the holding component; adhering the abrasive grains 2 on the adhesive portions; and sintering the holding component 3 to fix the abrasive grains 2. |