| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c72d118f5664072de841f9c5c34b9d99 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31507
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31855 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-513 |
| filingDate |
2005-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74ccb0922b5d5c81a9ed971a9cbcd735
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e512d8bc61be16a2edd950f93c2a2a69
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c776de74e2c25f08e6f744803225af01 |
| publicationDate |
2005-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2005202250-A1 |
| titleOfInvention |
High rate deposition of titanium dioxide |
| abstract |
There is provided a structure. The structure comprises a substrate, and a titanium oxide layer disposed over the substrate. There is also provided a method of forming a titanium oxide coating on a substrate. The method includes generating a plasma; providing a first reactant, comprising titanium, and a second reactant, comprising oxygen, into the plasma stream extending to the substrate; and forming the titanium oxide coating on the substrate. |
| priorityDate |
2002-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |