http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005189235-A1

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D7-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D13-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
filingDate 2005-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b485b1122ebae6fc9bdfb3856413ad14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aeaa1ad2c598813aa5c031ce6e6698f0
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publicationDate 2005-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2005189235-A1
titleOfInvention Multi-phase polishing pad
abstract An article of manufacture, a method, and an apparatus for use in a chemical mechanical polishing system is provided. In one aspect, an article of manufacture is provided for polishing a substrate including a polishing article having a polishing surface, the polishing surface including a first polishing portion having a first polishing material of a first hardness for polishing a first portion of the substrate, and a second polishing portion having a second polishing material of a second hardness for polishing a second portion of the substrate. The article of manufacturer may be disposed on a rotatable, stationary, or linear platen for processing a substrate. In another aspect, a method is provided for processing a substrate, including providing a platen containing the polishing article disposed on the rotatable platen, delivering a polishing composition to the polishing article, and contacting a substrate on the polishing article.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006178099-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7261625-B2
priorityDate 2001-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.