http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005151962-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-0625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-8422 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-41 |
| filingDate | 2004-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c2433cf432f8c7d163dd07505fb8bec |
| publicationDate | 2005-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2005151962-A1 |
| titleOfInvention | Measurement of optical properties of radiation sensitive materials |
| abstract | A system and method for measuring optical properties of films deposited or formed on semiconductor wafers. Measurements of an optical property are made in a plurality of non-overlapping locations within a test region of a film at a low radiation dose, and the measurements are averaged. The radiation dose is less than the actinic radiation sensitivity dose of the film, so that chemical changes in the film are not caused by the measurements. The measurements may be calibrated to prior art methods, and the results may be adjusted by the adjustment or calibration factor. |
| priorityDate | 2004-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.