Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2004-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c59485851f31050bab7984e3210153a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9dfe26f65c11e0f457772db6fa1aa707 |
publicationDate |
2005-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2005142486-A1 |
titleOfInvention |
Polymers and photoresist compositions comprising same |
abstract |
The present invention relates to new polymers and use of such polymers as a resin binder component for photoresist compositions, particularly chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Preferred polymers of the invention are terpolymers and tetrapolymers that can exhibit good adhesion to underlying inorganic surfaces such as SiON and Si 3 N 4 surfaces and contain repeat units with pendant moieties having heteroatom substitution. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8263307-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9726977-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010062374-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009269701-A1 |
priorityDate |
2003-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |