http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005130069-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d231147f38595bbe3114b758cba4a298 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2004-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59a02c81fe6cd970bec1f4129adf8d86 |
| publicationDate | 2005-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2005130069-A1 |
| titleOfInvention | Resist pattern forming method |
| abstract | Provided is a resist pattern forming method with a bi-layer resist process, which requires only a simple developing step equivalent to that of a single-layer resist process. The resist pattern forming method comprises the steps of: forming a lower-layer resist film on a substrate; forming a diffusion preventive film on the lower-layer resist film; forming an upper-layer resist film on the diffusion preventive film; exposing the lower-layer resist film and the upper-layer resist film simultaneously; and developing the lower-layer resist film and the upper-layer resist film simultaneously. Si as an etching resistance improving component is contained in the upper-layer resist film but not in the lower-layer resist film. The diffusion preventive film prevents diffusion of Si from the upper-layer resist film to the lower-layer resist film and transmits the light at the time of exposure, while having a characteristic of being eliminated by the developer solution at the time of developing. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010035177-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8124312-B2 |
| priorityDate | 2003-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.