| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-8422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-84 |
| filingDate |
2004-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a2b16880fa19088031b893a2a737b09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fbff4126445d75d962feaff7ca873f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_664c9b1b6cd02e8de0c9d51c6bcec8ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5067836375026445a03a6b195dee2ee2 |
| publicationDate |
2005-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2005118735-A1 |
| titleOfInvention |
Method for determining or inspecting a property of a patterned layer |
| abstract |
One embodiment of the invention provides a method for determining or inspecting a lateral dimension or a volume of a recess in a layer at a surface of a substrate or a property of a material arranged in the recess. The layer having the recess is irradiated with an electromagnetic scanning radiation having a wavelength that is greater than a lateral dimension of the recess, and an electromagnetic response radiation that emerges from an interaction of the scanning radiation with the layer having the recess is received. Characterization data, which characterize the interaction between the layer having the recess and the scanning radiation, are ascertained from the received electromagnetic response radiation, the characterization data mapping the lateral dimension or the volume of the recess or the property of the material arranged in the recess. The lateral dimension or the volume of the recess or the property of the material arranged in the recess is determined or inspected on the basis of the characterization data. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021398863-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007004177-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007004177-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009053834-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11626330-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3940337-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009094005-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018182967-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8868387-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10978278-B2 |
| priorityDate |
2003-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |