patent/US-2005093158-A1

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005093158-A1

Outgoing Links

Predicate	Object
assignee	http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2c78d80e9d323ad7c79518c80e0b8d16
classificationCPCAdditional	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-1026 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-09701 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76828
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filingDate	2003-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f209eb3dc3eac4cd4b6b3286c6ccb6b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_743ab128ea9c7819aab91815af1f7be7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8bf314c6d1c6536dd222bb9f20d0424c
publicationDate	2005-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	US-2005093158-A1
titleOfInvention	Self-patterning of photo-active dielectric materials for interconnect isolation
abstract	In accordance with the objectives of the invention a new method is provided for the creation of an interconnect pattern. The invention provides for a layer of Photo-Active Dielectric (PAD) to be used for the insulation material in which the interconnect pattern is created, this without the use of an overlying exposure mask of photoresist.
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priorityDate	2003-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 83.