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filingDate 2004-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2005-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2005084795-A1
titleOfInvention Over-coating composition for photoresist and process for forming photoresist pattern using the same
abstract Overcoating compositions for a photoresist and methods of using the same are disclosed. More specifically, overcoating compositions for a photoresist comprising materials which can weaken acid stably are disclosed. These materials neutralize large amounts of acid produced in the upper portion of a photoresist film, thereby uniformizing vertical distribution of the acids. As a result, vertical and fine patterns of less than 100 nm thickness can be obtained.
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