Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate |
2004-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec72e12d4077c325ad02dc88ccb08bb3 |
publicationDate |
2005-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2005084795-A1 |
titleOfInvention |
Over-coating composition for photoresist and process for forming photoresist pattern using the same |
abstract |
Overcoating compositions for a photoresist and methods of using the same are disclosed. More specifically, overcoating compositions for a photoresist comprising materials which can weaken acid stably are disclosed. These materials neutralize large amounts of acid produced in the upper portion of a photoresist film, thereby uniformizing vertical distribution of the acids. As a result, vertical and fine patterns of less than 100 nm thickness can be obtained. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011022087-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8221571-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011086955-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8092628-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8771927-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I502101-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8771442-B2 |
priorityDate |
2003-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |