| abstract |
A polymer comprising recurring units of formulae (1) to (4) wherein R 1 , R 3 , R 4 and R 7 are hydrogen or methyl, R 2 is an acid labile group, R 5 and R 6 are hydrogen or hydroxyl, and R 8 is a lactone structure group and having a Mw of 1,000-50,000 is provided. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and etching resistance and lends itself to lithographic micropatterning with electron beams or deep UV. |