abstract |
The present invention relates to an exhaust gas purifying apparatus comprising a plasma reactor containing at least one of a H 2 O adsorbent and a EC adsorbent; and a NO x adsorbent located downstream of said plasma reactor. Further, the present invention relates to an exhaust gas purifying apparatus comprising a plasma reactor containing at least one of a H 2 O adsorbent and a HC adsorbent, and a NO x adsorbent. Still further, the present invention relates to a method using the present apparatus. According to the present apparatus, by generating plasma in the plasma reactor, H 2 O trapped on the H 2 O adsorbent is activated to be a strong oxidant such as OH radical and O radical, and HC trapped on the HC adsorbent is activated to be radicals, lower HCs, etc. |