| abstract |
The present invention provides an image forming method comprising the steps of exposing imagewisely an image forming material having a photosensitive layer comprising an infrared absorbing agent, a polymerization initiator and a polymerizable compound on a substrate to overlapping infrared beams. The solubility of the photosensitive layer in an alkali developing solution reduces upon exposure to light of wavelengths in the range of 750 nm to 1400 nm. The exposed image forming material is developed, and the infrared beam diameter used in light exposure is 20 μm or less, and the overlapping coefficient is 0.8 or more. |