| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L77-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-107
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L77-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 |
| filingDate |
2002-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_388318a05405e06fb8d686547e2426b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fb592b5c8a9051c84f96cd398a57fa1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_386ef5a95009f78707c7b259663e5be3 |
| publicationDate |
2004-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2004180286-A1 |
| titleOfInvention |
Photosensitive resin composition, process of forming patterns with the same, and electronic components |
| abstract |
There are disclosed a photosensitive resin composition comprising: n at least one photosensitive resin among a polyamide resin (A) having a repeating unit (U 1 ) represented by general formula (I) below and a polyamideimide resin (B) having a repeating unit (U 2 ) represented by general formula (II); and n at least one photopolymerizable compound among a silane coupling agent (C) having a photopolymerizable unsaturated bond and a photopolymerizable unsaturated monomer (D) comprising a monomer (d1) having at least 5 photopolymerizable unsaturated bonds per molecule General formula (I): n n n (in the formula, X 1 denotes a trivalent organic group having an aromatic ring, Y 1 denotes a divalent organic group having an aromatic ring, and R 1 denotes a monovalent organic group having a photosensitive group) General formula (II): n n n (in the formula, X 2 and Y 2 denote trivalent organic groups having an aromatic ring, and R 2 denotes a monovalent organic group having a photosensitive group), a pattern production process using same, and an electronic component. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9365694-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008086860-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015030825-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9487665-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I392962-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11086219-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3325566-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10072164-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102082161-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2690124-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140121481-A |
| priorityDate |
2001-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |