http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004137370-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate | 2003-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_216ef81e34a4ab1bb0ffe6f0156846a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea063706d2656825b13f40b154d8afc0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c1d53b7671ad3babd5d3a57f40051ae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca7b5521fd9f8f059698cb520485deae |
| publicationDate | 2004-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2004137370-A1 |
| titleOfInvention | Method and apparatus for processing of radiation-sensitive patterning compositions |
| abstract | A method and system for processing patterning compositions such as those applied to printing plates are disclosed. An Infrared (IR) oven, instead of a conventional convection oven, is used for preheating image-wise exposed patterning composition before the exposed image is developed. In one embodiment of the invention, a substrate is coated with a layer of a patterning composition. The layer is then image-wise exposed. The coated substrate is then passed under one or more IR emitter tubes to preheat the image-wise exposed patterning composition, which is subsequently developed. The use of an IR oven offers the advantages of more precise and rapid temperature control, smaller system footprint, lower energy consumption and higher throughput as compared to the conventional methods and systems. |
| priorityDate | 2003-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 48.