Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0057 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
filingDate |
2003-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_616592672ec58e383ef5a431bad121c2 |
publicationDate |
2004-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2004065345-A1 |
titleOfInvention |
Method for cleaning substrate |
abstract |
A main object of the present invention is to provide a method for cleaning a substrate, in which a substrate surface can be cleaned by an easy and efficient process without causing any undesirable influence on the substrate. The present invention achieves the aforementioned object by providing a method for cleaning a substrate, wherein a substrate to be cleaned and a photocatalyst containing layer containing a photocatalyst, which is formed on a base material, are placed with no clearance or with a clearance between each other, and then, a surface of the substrate is cleaned by irradiating an energy from a predetermined direction. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007120471-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014035435-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7859187-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8891053-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010060870-A1 |
priorityDate |
2002-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |