Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-0376 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-09118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-09563 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-2072 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-09036 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0353 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0723 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-423 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-42 |
filingDate |
2002-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_259250d2e6d9ceb46315c74b96a312f0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a6afac2d408ad49fa92398573cd9893 |
publicationDate |
2004-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2004060728-A1 |
titleOfInvention |
Method for producing electroconductive structures |
abstract |
For the method for manufacturing electrically conducting structures one produces or prepares an electrically insulating layer so that it has a surface with recesses at the locations at which the electrically conducting structures are to arise. At least some of the recesses, perpendicular to a surface of the substrate, have a cross section in which the aspect ratio (the ratio between depth (t) and width (b) of the structures) is between 1:5 and 5:1, for example at least 2:3. The substrate surface is provided with an electrically conducting layer which is thin in comparison to the characteristic dimensions of the recesses. Subsequently the surface of the substrate is galvanised for so long until the recesses are filled. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009120660-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011114368-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1717351-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010316893-A1 |
priorityDate |
2001-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |