Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28518 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-461 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
filingDate |
2002-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_720037b753826dbdce87ae9bc4e224a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c8194a573ed2b0b6141445dd7489779 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94924591a72e5e7de23eb9a05eee622e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab83f9f7aca2231c874034905dfbd480 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f88190da4731331967e8a707ec843766 |
publicationDate |
2004-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2004043624-A1 |
titleOfInvention |
Method of high selectivity wet etching of salicides |
abstract |
A method for forming salicides with lower sheet resistance and increased sheet resistance uniformity over a semiconductor process wafer including providing a semiconductor process wafer having exposed silicon containing areas at a process surface; depositing a metal layer including at least one of cobalt and titanium over the process surface; carrying out at least one thermal annealing process to react the metal layer and silicon to form a metal silicide over the silicon containing areas; and, wet etching unsilicided areas of the metal layer with a wet etching solution including phosphoric acid (H 3 PO 4 ), nitric acid (HNO 3 ), and a carboxylic acid to leave salicides covering silicon containing areas at the process surface. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8092698-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008314868-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006231910-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7382028-B2 |
priorityDate |
2002-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |