http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004043624-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28518
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-461
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
filingDate 2002-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_720037b753826dbdce87ae9bc4e224a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c8194a573ed2b0b6141445dd7489779
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94924591a72e5e7de23eb9a05eee622e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab83f9f7aca2231c874034905dfbd480
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f88190da4731331967e8a707ec843766
publicationDate 2004-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2004043624-A1
titleOfInvention Method of high selectivity wet etching of salicides
abstract A method for forming salicides with lower sheet resistance and increased sheet resistance uniformity over a semiconductor process wafer including providing a semiconductor process wafer having exposed silicon containing areas at a process surface; depositing a metal layer including at least one of cobalt and titanium over the process surface; carrying out at least one thermal annealing process to react the metal layer and silicon to form a metal silicide over the silicon containing areas; and, wet etching unsilicided areas of the metal layer with a wet etching solution including phosphoric acid (H 3 PO 4 ), nitric acid (HNO 3 ), and a carboxylic acid to leave salicides covering silicon containing areas at the process surface.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8092698-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008314868-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006231910-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7382028-B2
priorityDate 2002-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6271133-B1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID944
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1017
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578708
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474255
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID971
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID417109324
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474387
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474234
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123854965
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID311
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID335
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6336889
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419538597
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1004
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID612
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457765275
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID129823890
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID196
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID743
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1110
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID176
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10690
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID406954886
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID406903350
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419490743
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474096
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419545355
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474094
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID413807576
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID757
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID447315
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID104730
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419487220
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7991
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID784
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23963
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID407364031
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474445
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474136
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559477
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID284
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411550722
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458391437
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559357
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID867
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID129086521
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID444972
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID723
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474451
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1032
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID407631466

Total number of triples: 79.