| abstract |
A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III: n n n wherein R 1 , R 4 , R 5 and R 6 are each independently H, lower alkyl, CH 2 CO 2 R 10 , cyano, CH 2 CN, or halogen, wherein R 10 is any alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl or siloxy or linear or cyclic polysiloxane group; R 2 is CHR 11 R 12 where R 11 and R 12 are each independently H, lower alkyl, cycloalkyl or aryl; A is a substituted or unsubstituted alkylene, cycloalkylene, alkylenecycloalkylene, or alkylenearylene; and R 3 is linear, branched or cyclic fluoroalkyl group or SiR 13 R 14 R 15 where R 13 , R 14 , and R 15 are each independently alkyl, cycloalkyl, aryl, arylalkyl, alkylenecycloalkyl, silyl, siloxy, linear or cyclic polysiloxane or silsesquioxane alkyl group; B is an aryl, C(═O)—O—(CH 2 ) x where x= 0−4 , lower alkyl, cycloalkyl, alkene cycloalkyl, silyl, siloxyl, or linear or cyclic polysiloxane group. R 7 is H or an acid sensitive group; R 8 and R 9 are each independently H or —CN group; and y=0−4 and the use of these polymers in radiation sensitive compositions for exposure to actinic radiation, especially radiation of 157 nm. |