| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-105 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-105 |
| filingDate |
2003-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_106f81cadca18c8722bf14d369c67bab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3be830ab435e2f46d2831411f836ac6 |
| publicationDate |
2004-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2004029042-A1 |
| titleOfInvention |
Photoresist systems |
| abstract |
New photoresist systems are provided that comprise an underlying processing (or barrier) layer composition and an overcoated photoresist layer. Systems of the invention can exhibit significant adhesion to SiON and other inorganic surface layers. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003180559-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6852421-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102592978-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004067437-A1 |
| priorityDate |
2002-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |