http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004029032-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2003-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7cba3c180b6c1246644ff8545349ed7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2bbd7189384db74f2709efd1e5a4eecd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc0bef9e7b0457cf33425f89ce157bfc |
| publicationDate | 2004-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2004029032-A1 |
| titleOfInvention | Positive photoresist composition |
| abstract | A photoresist composition comprising a novolac resin in which 3-27 mol % of the hydroxyl group hydrogens are substituted with 1,2-naphthoquinonediazidosulfonyl groups and an alkali-soluble cellulose whose glucose ring substituent groups are substituted with organic groups at a specific rate is used in microprocessing as a positive photoresist and offers many advantages including uniformity, high sensitivity, high resolution, good pattern shape, heat resistance, film retention, substrate adhesion, shelf stability, and high throughput. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007032060-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7910223-B2 |
| priorityDate | 2002-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 54.