Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68327 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6836 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68 |
filingDate |
2003-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_641f69c80467018a6735e6758f42a609 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fc03dc845f35d9349b20ef2ee464db7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89bc99488539b17c301e8df59daa301e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a30b9c6abda38a880f7cd142b0df3836 |
publicationDate |
2004-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2004023470-A1 |
titleOfInvention |
Novel material to improve image sensor yield during wafer sawing |
abstract |
A new method is provided of treating the wafer prior to the process of singulating the wafer into individual die. A first surface of the wafer over which CMOS image sensor devices have been created is coated with a layer of material that is non-soluble in water. The wafer is attached to a tape by bringing a second surface of the wafer in contact with the tape. The wafer is singulated by approaching the first surface of the wafer and by sawing first through the layer of material that has been coated over the first surface of the wafer and by then sawing through the wafer, stopping at the surface of the tape. A thorough water rinse is applied to the surface of the singulated wafer, followed by a wafer clean applying specific chemicals for this purpose. The singulated die is now removed from the tape and further processed by applying steps of die mount, wire bonding, surrounding the die in a mold compound and marking the package. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8033011-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102487552-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006078374-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11309345-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7109055-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010035405-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190094704-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7859068-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006160264-A1 |
priorityDate |
2002-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |