Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b55c349b43c3ecba4977fd52cc8f8c67 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-001 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-138 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate |
2003-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b3918f99d03e500a974b0e7ee3a1987 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e84dba53f3ee2874af6f193ff85a6540 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9430173234e223697c182e7b1037b3a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_edbfd1db39baedabbe74fedc5d5b17a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c1b5b9614d9a991f92d9bda0143c8be |
publicationDate |
2004-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2004013816-A1 |
titleOfInvention |
Process of producing polymer optical waveguide |
abstract |
A process of producing a polymer optical waveguide, including (a) a step of forming an undercladding layer on a substrate; (b) a step of forming a photosensitive resin composition layer containing a 1,4-dihydropyridine derivative and a resin on the undercladding layer; (c) a step of irradiating a region of the photosensitive resin composition layer corresponding to a core pattern with UV light through a mask to form UV light-exposed areas and UV light-unexposed areas on the photosensitive resin composition layer; (d) a step of heating the UV light-exposed areas and UV light-unexposed areas of the photosensitive resin composition layer; and (e) a step of forming an overcladding layer on the photosensitive resin composition layer after heating. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002141702-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009305170-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016238416-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011084787-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004158021-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7968274-B2 |
priorityDate |
2002-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |