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publicationDate 2003-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2003235986-A1
titleOfInvention Silicon oxide etching compositions with reduced water content
abstract Silicon oxide etching solutions consisting essentially of the product of at least one bifluoride source compound dissolved in a solvent consisting of about 90% to 100% by weight of at least one carboxylic acid and 0 to about 10% by weight water, wherein the total concentration of bifluoride source compound is between about 1.25 and about 5.0 moles per kilogram of solvent. Methods for selectively removing silicon oxides and metal silicates from metal surfaces are also disclosed.
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