| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2002-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a181d656a00f0be4a0849d92f21648d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0da5708bb45d88b87a655a2817fdc610 |
| publicationDate |
2003-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2003232274-A1 |
| titleOfInvention |
Photoacid-labile polymers and photoresists comprising same |
| abstract |
The present invention relates to new polymers that contain photoacid-labile groups that comprise arylalkyl groups. Particularly preferred are polymers having a benzylic carbon directly linked to an ester oxygen. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9206276-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7993810-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7297616-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005032373-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009170029-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003235777-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9182662-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9182669-B2 |
| priorityDate |
2001-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |