| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_783876e0791de6f065a785baadee1801 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0076
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-145 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41C1-10 |
| filingDate |
2003-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb35b88be2f4487b43efb51fa8c1b937
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2fc4d33a9193dd5138e2dcd5b612b596
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7aa07a90d53d3718de2ef4131600c69
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_083d7dce37001581fd4ab6edbf3295fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_759c773a69912c08276e00f7bb041666 |
| publicationDate |
2003-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2003190533-A1 |
| titleOfInvention |
Manufacture of masks and electronic parts |
| abstract |
Imageable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infrared absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101312760-B1 |
| priorityDate |
2000-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |