| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-267
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-266 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-102
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0021 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50 |
| filingDate |
2002-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e40388dbbc99794dbef255ca891b6bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fae9c02ab35b42148db55d2d222850c6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_571da3c726afe5327fd59eb31211559f |
| publicationDate |
2003-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2003181343-A1 |
| titleOfInvention |
Composition and method for removing photoresist materials from electronic components |
| abstract |
Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003047533-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6958123-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006127799-A1 |
| priorityDate |
1998-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |