| abstract |
A method of manufacturing thin film transistors includes the steps of depositing and patterning a plurality of layers ( 3,13,15,23 ) to define the thin film transistors, wherein one of the plurality of layers ( 23 ) is patterned using a higher definition process and others ( 3,13,15 ) of the plurality of layers are patterned using a lower definition process. In particular, a metallization layer ( 23 ) defining the source and drain of the thin film transistors may be patterned using the high definition process and the other layers patterned by the low definition process. The high definition process may be photolithography and the low definition process may be printing. |