| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4efee27937b4a512f45809fed5293747 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-21 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3226 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-322 |
| filingDate |
2002-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc81e08a4cc5ef9cc39015d927220a04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a28bf58c578dd149e13ade5f8bb024a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb3b2149e7ce72a2e974f871735c56f6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc4c2f56620d6dff0e5660fbd5281067
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7764d2a4b77e7083c69e0677329b8985
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36d42fec2e7c6b4672aa91bbb2f909d2 |
| publicationDate |
2003-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2003136961-A1 |
| titleOfInvention |
Ideal oxygen precipitating silicon wafers with nitrogen/carbon stabilized oxygen precipitate nucleation centers and process for making the same |
| abstract |
A silicon wafer having a controlled oxygen precipitation behavior such that a denuded zone extending inward from the front surface and oxygen precipitates in the wafer bulk sufficient for intrinsic gettering purposes are ultimately formed. Specifically, prior to formation of the oxygen precipitates, the wafer bulk comprises dopant stabilized oxygen precipitate nucleation centers. The dopant is selected from a group consisting of nitrogen and carbon and the concentration of the dopant is sufficient to allow the oxygen precipitate nucleation centers to withstand thermal processing such as an epitaxial deposition process while maintaining the ability to dissolve any grown-in nucleation centers. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005247259-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7962109-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7956615-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006046431-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7977919-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008122043-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8536837-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004166684-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7820549-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7740702-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8035397-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007101925-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7160385-B2 |
| priorityDate |
2001-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |