| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
| filingDate |
2002-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_592f2b36d0695b1340fb5451bddeaedd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_188225d8c5c3fbac443dcde874d0f894 |
| publicationDate |
2003-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2003107865-A1 |
| titleOfInvention |
Wafer handling apparatus and method of manufacturing the same |
| abstract |
Disclosed is a wafer handling device having a coating layer (3) surrounding a wafer handling device (1,2) that consists essentially of non-crystalline carbon (DLC) having electric resistivity ranging from 10 sup 8 to 10 sup 13/ &-cm. The coating layer preferably contains 15-26 atom % of hydrogen. The coating layer preferably has an intensity ratio of 0.7-1.2, the intensity ratio being defined as a ratio of an intensity at 1360 cm −1 to another intensity at 1500 cm −1 when said coating layer is subjected to Raman spectroscopic analysis. The coating layer is manufactured by the P-CVD process wherein hydrocarbon (CxHy) is introduced into a vacuum container and ionized therein by ionizing process and ionized hydrocarbon is deposited on the surface of said wafer handling device by applying thereto a predetermined pulse voltage within an after-glow time of smaller than 250 microseconds. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1513191-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1513191-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006096946-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11612972-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009315078-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016243580-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022063035-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10610884-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10738380-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020135466-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7364624-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10840114-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004173161-A1 |
| priorityDate |
2000-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |