| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_082507838ffd3a482218a2d116731fbd |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2006-90
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-60 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G23-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01F17-235
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G23-053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-3653
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G23-053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G23-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C1-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01F17-235 |
| filingDate |
2002-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ef641cd05c12b95f6f0cd81a3cbee70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a296c62168a93c528d932aa8db21316f |
| publicationDate |
2003-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2003093957-A1 |
| titleOfInvention |
Process for producing abrasive particles and abrasive particles produced by the process |
| abstract |
The present invention provides a process for producing particles suitable for use as abrasives in chemical-mechanical polishing slurries. The process according to the invention includes mixing at least one crystallization promoter such as Ti[OCH(CH 3 ) 2 )] 4 with at least one cerium compound and at least one solvent, and subjecting said mixture to hydrothermal treatment at a temperature of from about 60° C. to about 700° C. to produce the particles. Particles formed in accordance with the present invention exhibit a large crystallite size, and can be used to polish silicon-containing substrates to a high degree of planarity at a relatively high rate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016221146-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016069244-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10319601-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10293458-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110137346-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006032147-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115160935-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102408128-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102732157-A |
| priorityDate |
2001-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |