| abstract |
A method of employing organic vapor phase deposition to fabricate a polycrystalline organic thin film is described. By employing organic vapor phase deposition at moderate deposition chamber pressures and substrate temperatures, a polycrystalline organic thin film results having significantly larger purity and grain size than what is achievable by vacuum thermal evaporation. These polycrystalline organic thin films may be employed in a variety of applications, including, for example, organic light emitting devices, photovoltaic cells, photodetectors, lasers, and thin film transistors. |