http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003031951-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-262 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-02 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1008 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M5-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41C1-10 |
| filingDate | 2002-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c81938b0fbc61c76fca58a95b0e11e3 |
| publicationDate | 2003-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2003031951-A1 |
| titleOfInvention | Photosensitive composition, photosensitive lithographic printing plate, and process for producing lithographic printing plate |
| abstract | A photosensitive composition can be directly written on by a solid laser or semiconductor laser emitting infrared rays and is superior in storage stability and baking scum resistance, a photosensitive lithographic printing plate, and a process for producing a lithographic printing plate are provided. The photosensitive composition contains an alkali-soluble resin, an infrared absorber which absorbs light to generate heat, and an antioxidant which prevents the alkali-soluble resin and the infrared absorber from oxidizing. The antioxidant is preferably a phosphite compound and/or a mercaptoimidazole compound. Preferably, the photosensitive composition further contains a cyclic acid anhydride. In a photosensitive lithographic printing plate, a photosensitive layer made of the photosensitive composition described above is formed on a substrate. According to the process for producing a lithographic printing plate, the photosensitive layer of the photosensitive lithographic printing plate described above is imagewise exposed to activating rays having a wavelength of 700 nm or more, and then the exposed area is removed by dissolving in an alkali developing solution. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011076613-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7429445-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005260934-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008220365-A1 |
| priorityDate | 2001-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 230.