http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003022099-A1

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
filingDate 2001-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f1561c110a989a675dbfe99d6ea845e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7990b7992e448c3e5ad8441ec1bbae06
publicationDate 2003-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2003022099-A1
titleOfInvention Photoresist with adjustable polarized light reaction and photolithography process using the photoresist
abstract A photoresist with adjustable polarized light response and a photolithography process using the photoresist. The photoresist and the photolithography process are suitable for use in an exposure optical system with a high numerical aperture. The photoresist includes a photosensitive polymer that can absorb the exposure light source to generate an optical reaction. The photosensitive polymer can also be oriented along a direction of an electric field or a magnetic field. The response for the photosensitive upon a polarized light is determined by an angle between the predetermined direction and the polarized light. In addition, the photolithography process adjusts the orientation of the photosensitive polymer, so that the P-polarized light has a weaker response than that of the S-polarized light to compensate for the larger transmission coefficient of the P-polarized light with a high numerical aperture, so as to prevent the photoresist pattern deformation.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE42248-E
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11036141-B2
priorityDate 2001-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6115514-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6277539-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002160314-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5917980-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414860340
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6966

Total number of triples: 19.