http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003017404-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2002-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7a39aef1dbacecc7574affb2c60427d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df645877e42d38c4b289ee50fe5d0a06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a2edd1b614d9b235c247ae7895e9e7c |
| publicationDate | 2003-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2003017404-A1 |
| titleOfInvention | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same |
| abstract | A chemical amplification photoresist monomer, a photoresist polymer prepared thereof, and a photoresist composition using the polymer. More specifically, a chemical amplification photoresist polymer comprising a fluorine-containing monomer represented by Chemical Formula 1, and a composition comprising the polymer. n The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. As the composition has low light absorbance at 193 nm and 157 nm wavelength, it is very useful for forming ultramicro pattern in the process using a light source of far ultraviolet, especially of VUV (157 nm). n n n In the Formula, R 1 , R 2 , R 3 and R 4 is defined in the specification. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018005469-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021138383-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021138382-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11746166-B2 |
| priorityDate | 2001-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 147.